rus
Competent opinion
V.Bespalov
MIET: integration of education, science and production Interview with rector of National Research University of Electronic Technology (MIET).
MIET: integration of education, science and production Interview with rector of National Research University of Electronic Technology (MIET).
Nanotechnology
S.Udovichenko, A.Pisarev, A.Busygin, O.Maevsky
3D CMOS, memristor nanotechnology for creating logical and memory matrices of neuroprocessor The super-large multi-layered logical and storage matrices are main components of the neuroprocessor, which is an electronic device that processes information like the brain. The topology of the logical and storage cells is presented. Matrices based on these cells can be manufactured using vacuum nanotechnology, which combines classical transistor CMOS (complementary metal-oxide-semiconductor) technology with a memristor crossbar technology.
3D CMOS, memristor nanotechnology for creating logical and memory matrices of neuroprocessor The super-large multi-layered logical and storage matrices are main components of the neuroprocessor, which is an electronic device that processes information like the brain. The topology of the logical and storage cells is presented. Matrices based on these cells can be manufactured using vacuum nanotechnology, which combines classical transistor CMOS (complementary metal-oxide-semiconductor) technology with a memristor crossbar technology.
Tags: cmos technology logical and storage matrices memristor vacuum nanotechnology вакуумная нанотехнология кмоп-технология логическая и запоминающая матрицы мемристор
N.Gerasimenko, A.Volokhovsky, O.Zaporozhan
Features of control of silicon nanostructures technology Considering the process for the production of silicon nanostructures, it is important to take into account their transition to the state of dimensional quantization accompanied by a change in their mechanical and structural properties. These effects also need to be taken into account when developing a process control system for the production of devices and systems containing nanoscale structures. In this paper, we consider new requirements for the process control, including those for the equipment with use of which this control is carried out.
Features of control of silicon nanostructures technology Considering the process for the production of silicon nanostructures, it is important to take into account their transition to the state of dimensional quantization accompanied by a change in their mechanical and structural properties. These effects also need to be taken into account when developing a process control system for the production of devices and systems containing nanoscale structures. In this paper, we consider new requirements for the process control, including those for the equipment with use of which this control is carried out.
Tags: optical scatterometry small-angle x-ray scattering spectral ellipsometry x-ray reflectometry малоугловое рентгеновское рассеяние оптическая скаттерометрия рентгеновская рефлектометрия спектральная эллипсометрия
Test & Measurement
I.Pylev, I.Yaminsky
Nanometer standard One of the problems of nanometrology is to create simple and affordable standard of length in the nanometer range. At the moment there is no small-sized standard with a length of exactly 1 nm, with which it would be possible to carry out the calibration of the scanning probe microscope directly in the scanning process. Its creation greatly simplifies the calibration of the microscope, and the standard itself is a solid metrological basis for the development of promising nanotechnologies.
Nanometer standard One of the problems of nanometrology is to create simple and affordable standard of length in the nanometer range. At the moment there is no small-sized standard with a length of exactly 1 nm, with which it would be possible to carry out the calibration of the scanning probe microscope directly in the scanning process. Its creation greatly simplifies the calibration of the microscope, and the standard itself is a solid metrological basis for the development of promising nanotechnologies.
Tags: inverse piezoelectric effect nanometer nanometrology nanoscopy nanotechnology scanning probe microscopy standard нанометр нанометрология наноскопия нанотехнологии обратный пьезоэффект сканирующая зондовая микроскопия эталон
S.Stepanov, S.Tarasov, A.Petrov, S.Stepanov
Investigation of comparison error when testing gauge blocks using UКМ-100 tool The accuracy of the Russian UKM-100 comparator for testing the gauge blocks according
to the international method of calibration of gauge block comparators has been studied. It is shown that the calibration is more flexible and definite method of estimating the accuracy capabilities of the reference instruments than the use of the verification scheme.
Investigation of comparison error when testing gauge blocks using UКМ-100 tool The accuracy of the Russian UKM-100 comparator for testing the gauge blocks according
to the international method of calibration of gauge block comparators has been studied. It is shown that the calibration is more flexible and definite method of estimating the accuracy capabilities of the reference instruments than the use of the verification scheme.
Equipment for nanoindustry
A.Ahmetova, Yu.Belov, I.Yaminsky
ATCNano, three-axis CNC milling and engraving center Every day the Nanotechnology youth innovation creativity centre is working on development of interesting, practically feasible and perspective projects. One of the most popular areas in the market today is the creation of CNC machines.
ATCNano, three-axis CNC milling and engraving center Every day the Nanotechnology youth innovation creativity centre is working on development of interesting, practically feasible and perspective projects. One of the most popular areas in the market today is the creation of CNC machines.
Tags: milling machine multi-axis machining center scanning probe microscopy многоосевой обрабатывающий центр сканирующая зондовая микроскопия фрезерный станок
Conferences, Exhibitions, Seminars
D.Gudilin
minimal Fab, look into future of semiconductor industry A seminar on the new Japanese minimal Fab technology was held at the National Research University of Electronic Technology (MIET).
minimal Fab, look into future of semiconductor industry A seminar on the new Japanese minimal Fab technology was held at the National Research University of Electronic Technology (MIET).
L.Ratkin
Nanotechnological developments for aerospace industry In the framework of the scientific program of the International Aviation and Space Salon MAKS 2017, a conference "Space corporations of the future in Industry 4.0" was held.
Nanotechnological developments for aerospace industry In the framework of the scientific program of the International Aviation and Space Salon MAKS 2017, a conference "Space corporations of the future in Industry 4.0" was held.
Issues of patenting
D.Sokolov
Practical advice on patent research according to GOST R 15.011-96 Implementation of the main stages of patent research in compliance with GOST R 15.011-96 according to the practice of recent years is discussed.
Practical advice on patent research according to GOST R 15.011-96 Implementation of the main stages of patent research in compliance with GOST R 15.011-96 according to the practice of recent years is discussed.
Infrastructure
K.Borisov, E.Gruzinova, O.Kokorev, A.Malakhov, A.Petrov, A.Semin, A.Skuratov
Implementation of program of nanotechnology industry development in Russian Federation until 2015 The main results of the state programs for the development of the nanotechnology industry in the Russian Federation are considered. Achievements in the field of creation and development of the infrastructure of the industry, training of personnel, standardization, protection of intellectual property, support of R&D and industrial production of nanotechnology products are noted.
Implementation of program of nanotechnology industry development in Russian Federation until 2015 The main results of the state programs for the development of the nanotechnology industry in the Russian Federation are considered. Achievements in the field of creation and development of the infrastructure of the industry, training of personnel, standardization, protection of intellectual property, support of R&D and industrial production of nanotechnology products are noted.