rus
TS_pub
technospheramag
technospheramag
ТЕХНОСФЕРА_РИЦ
Special Issue/2019
A. L. Potapov, I. B. Yashanin
Optimization and prospects of introducing the process of radiation rejection of microcircuits
Optimization and prospects of introducing the process of radiation rejection of microcircuits
To ensure the resistance microcircuits to special factors, radiation rejection (RR) is used. An analysis of changes in the criteria parameters in the RR process has shown a possibility of optimizing the RR process. The possibility and expediency of expanding the number of parameters measured at RR have been shown.
To ensure the resistance microcircuits to special factors, radiation rejection (RR) is used. An analysis of changes in the criteria parameters in the RR process has shown a possibility of optimizing the RR process. The possibility and expediency of expanding the number of parameters measured at RR have been shown.
Readers feedback
