rus
Special Issue/2019
E. L. Kharchenko, A. V. Kuzovkov, V. V. Ivanov
Optimizing SRAF placement to increase photolithography resolution
Optimizing SRAF placement to increase photolithography resolution
The paper presents the optimization method of SRAF placement with a view to expanding the process window and as a result increasing the resolution of photolithography.
The paper presents the optimization method of SRAF placement with a view to expanding the process window and as a result increasing the resolution of photolithography.
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