rus
TS_pub
technospheramag
technospheramag
ТЕХНОСФЕРА_РИЦ
Special Issue/2019
V. A. Chetverikov, G. V. Baranov, A. G. Italyantsev, A. S. Klyuchnikov
The eff ect of pore formation at thermal growth of metal silicides on the surface of bulk nanoscale Si structures
The eff ect of pore formation at thermal growth of metal silicides on the surface of bulk nanoscale Si structures
The paper deals with the experimentally found effect of pore formation on the surface of silicon structures, as well as the phenomenological model of porosity formation in the process of silicidation reaction on the surface of silicon fin-structure.
The paper deals with the experimentally found effect of pore formation on the surface of silicon structures, as well as the phenomenological model of porosity formation in the process of silicidation reaction on the surface of silicon fin-structure.
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