Special Issue/2019
D. V. Vertyanov, V. N. Sidorenko, M. M. Burakov, I. A. Belyakov
Technologies of Inter-level Interconnection Formation for Manufacturing 3D Microassemblies
Technologies of Inter-level Interconnection Formation for Manufacturing 3D Microassemblies
The paper considers methods for inter-level interconnection formation in microassemblies using plated through-silicon vias and edge interconnection traces on the compound as well as describes samples of high-density silicon boards. Besides, it presents the results of studies on the processes of compounds plating and laser-induced ablation from the surface of the dielectric.
The paper considers methods for inter-level interconnection formation in microassemblies using plated through-silicon vias and edge interconnection traces on the compound as well as describes samples of high-density silicon boards. Besides, it presents the results of studies on the processes of compounds plating and laser-induced ablation from the surface of the dielectric.
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